O’Dell, Luke A.; Gunawidjaja, Philips N.; Holland, Mark A.; Mountjoy, Gavin; Pickup, Dave M.; Newport, Robert J.; Smith, Mark E.
(Elsevier, 2008)
The HfO2–SiO2 system is attracting interest as a possible new dielectric material in semiconductor devices. Knowledge of the location of hafnium within the silica network and the effect hafnium has on the structure will ...